Volume : 2, Issue : 3, MAR 2016
CHARACTERIZATION OF TITANIUM PHTHALOCYANINE DICHLORIDE THIN FILMS AND ITS USE AS GAMMA RADIATION SENSOR
REGIMOL C CHERIAN
The temperature at which the substrate is maintained during deposition is the most critical parameter determining the structure and properties of thin solid films. Halogenated metallo- phthalocyanine thin films are suitable for gas sensing applications. Titanium phthalocyanine dichloride (TiPcCl ) thin films are prepared on pre-cleaned glass substrates kept at different temperatures ranging from 300K 2 to 475K by vacuum sublimation technique. The effects of substrate temperature on the optical band gap have been studied by recording absorption spectrum. The dependence of substrate temperature on electrical conductivity of thin films is studied from the Arrhenius plots Ln Vs 1000/T. Structural studies are done by analyzing the X-ray diffractograms of thin films and different micro structural parameters such as lattice constant, grain size, lnternal strain and dislocation density are determined. It is found that optical band gap, thermal activation energy and structural parameters vary considerably with substrate temperature. . Thin films are irradiated with gamma radiation for differentexposure times and different dosages. Effect of irradiation on optical and electrical properties of the samples are also studied.
Organic semiconductors, Substrate temperature, Optical properties, Electrical properties
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